A layout-dependent circuit-design model from Toshiba helps boost gate density and improve cost-performance in next-generation 45-nm CMOS technology. More specifically, 45-nm CMOS gate density can be 2 ...
The electronics industry is in the midst of a transformation that is drastically changing product design and manufacture. Deep submicron process technology puts more gates on a chip, and the ...
With lithography techniques rapidly approaching 0.10 µm andsmaller, the combination of small device dimensions and high-speeddata rates causes many problems for IC ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results